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1

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 21 August 2011)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors V - Strategies for nanoscale contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Postek, Michael T., Dixson, Ronald G., Vládar, András E., Postek, Michael T.

Year:

2011

Language:

english

File:

PDF, 755 KB

english, 2011

2

Distributed force probe bending model of critical dimension atomic force microscopy bias

Ukraintsev, Vladimir A., Orji, Ndubuisi G., Vorburger, Theodore V., Dixson, Ronald G., Fu, Joseph, Silver, Rick M.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2013

Language:

english

File:

PDF, 4.03 MB

english, 2013

3

Multiple-instrument evaluation of the consistency and long-term stability of tip width calibration for critical dimension atomic force microscopy

Dixson, Ronald G., Orji, Ndubuisi G.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2017

Language:

english

File:

PDF, 1.01 MB

english, 2017

4

Lateral tip control effects in critical dimension atomic force microscope metrology: the large tip limit

Dixson, Ronald G., Orji, Ndubuisi G., Goldband, Ryan S.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 968 KB

english, 2016

5

Contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Dixson, Ronald G., Ng, Boon Ping, Vladár, András E., Postek, Michael T.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 3.31 MB

english, 2016

6

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Traceable atomic force microscope dimensional metrology at NIST

Dixson, Ronald, Archie, Chas N., Orji, Ndubuisi G., Fu, Joseph, Cresswell, Michael, Allen, Rich, Guthrie, Will

Year:

2006

Language:

english

File:

PDF, 132 KB

english, 2006

7

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Defect inspection strategies for 14 nm semiconductor technology

Buengener, Ralf, Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 548 KB

english, 2012

8

Process optimization for lattice-selective wet etching of crystalline silicon structures

Dixson, Ronald G., Guthrie, William F., Allen, Richard A., Orji, Ndubuisi G., Cresswell, Michael W., Murabito, Christine E.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 1.46 MB

english, 2016

9

Scanning probe microscope dimensional metrology at NIST

Kramar, John A, Dixson, Ronald, Orji, Ndubuisi G

Journal:

Measurement Science and Technology

Year:

2011

Language:

english

File:

PDF, 1.33 MB

english, 2011

10

Transmission electron microscope calibration methods for critical dimension standards

Orji, Ndubuisi G., Dixson, Ronald G., Garcia-Gutierrez, Domingo I., Bunday, Benjamin D., Bishop, Michael, Cresswell, Michael W., Allen, Richard A., Allgair, John A.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 2.71 MB

english, 2016

11

Robust auto-alignment technique for orientation-dependent etching of nanostructures

McGray, Craig D., Kasica, Richard, Orji, Ndubuisi G., Dixson, Ronald, Cresswell, Michael W., Allen, Richard A., Geist, Jon

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2012

Language:

english

File:

PDF, 3.22 MB

english, 2012

12

Progress on implementation of a reference measurement system based on a critical-dimension atomic force microscope

Orji, Ndubuisi G.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2007

Language:

english

File:

PDF, 851 KB

english, 2007

13

Measurement traceability and quality assurance in a nanomanufacturing environment

Orji, Ndubuisi G.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2011

Language:

english

File:

PDF, 804 KB

english, 2011

14

Evaluation of carbon nanotube probes in critical dimension atomic force microscopes

Choi, Jinho, Park, Byong Chon, Ahn, Sang Jung, Kim, Dal-Hyun, Lyou, Joon, Dixson, Ronald G., Orji, Ndubuisi G., Fu, Joseph, Vorburger, Theodore V.

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2016

Language:

english

File:

PDF, 3.46 MB

english, 2016

15

Spatial Dimensions in Atomic Force Microscopy: Instruments, Effects, and Measurements

Dixson, Ronald, Orji, Ndubuisi, Misumi, Ichiko, Dai, Gaoliang

Journal:

Ultramicroscopy

Year:

2018

Language:

english

File:

PDF, 1.65 MB

english, 2018

16

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - 6-DOF displacement and angle measurements using heterodyne laser encoder

Pan, Ssu-Wen, Hsieh, Hung-Lin, Wang, Wei-Cheng, Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 967 KB

english, 2013

17

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Advances in metrology for the determination of Young's modulus for low-k dielectric thin films

King, Sean, Antonelli, George A., Stan, Gheorghe, Cook, Robert F., Sooryakumar, R., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 550 KB

english, 2012

18

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - Pulse-to-pulse stability analysis in a frequency-doubled, q-switched Nd:YAG rod-laser

Tunes, Matheus A., Schön, Cláudio G., Wetter, Niklaus Ursus, Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 306 KB

english, 2013

19

Traceable pico-meter level step height metrology

Ndubuisi G. Orji, Ronald G. Dixson, Joseph Fu, Theodore V. Vorburger

Journal:

Year:

2004

Language:

english

File:

PDF, 268 KB

english, 2004

20

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Single crystal critical dimension reference materials (SCCDRM): process optimization for the next generation of standards

Dixson, Ronald G., Archie, Chas N., Guthrie, William F., Cresswell, Michael, Allen, Richard A., Orji, Ndubuisi G.

Year:

2007

Language:

english

File:

PDF, 174 KB

english, 2007

21

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - Controlling high-throughput manufacturing at the nano-scale

Cooper, Khershed P., Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 204 KB

english, 2013

22

Effects of lateral tip control in CD-AFM width metrology

Dixson, Ronald, Ping Ng, Boon, Orji, Ndubuisi

Journal:

Measurement Science and Technology

Year:

2014

Language:

english

File:

PDF, 3.50 MB

english, 2014

23

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Metrology, Inspection, and Process Control for Microlithography XXVI - Contour metrology using critical dimension atomic force microscopy

Orji, Ndubuisi G., Dixson, Ronald G., Vladár, András E., Ming, Bin, Postek, Michael T., Starikov, Alexander

Year:

2012

Language:

english

File:

PDF, 1.32 MB

english, 2012

24

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - Comparison and uncertainties of standards for critical dimension atomic force microscope tip width calibration

Dixson, Ronald, Archie, Chas N., Orji, Ndubuisi G.

Year:

2007

Language:

english

File:

PDF, 131 KB

english, 2007

25

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Metrology challenges for high-rate nanomanufacturing of polymer structures

Mead, Joey, Barry, Carol, Busnaina, Ahmed, Isaacs, Jacqueline, Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 503 KB

english, 2012

26

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - Inkjet printing of carrier transport layers for inverted organic solar cells

Danielson, Eric, Subbaraman, Harish, Dodabalapur, Ananth, Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 1.29 MB

english, 2013

27

Tip characterization method using multi-feature characterizer for CD-AFM

Orji, Ndubuisi G., Itoh, Hiroshi, Wang, Chumei, Dixson, Ronald G., Walecki, Peter S., Schmidt, Sebastian W., Irmer, Bernd

Journal:

Ultramicroscopy

Year:

2016

Language:

english

File:

PDF, 4.25 MB

english, 2016

28

[American Thoracic Society American Thoracic Society 2020 International Conference, May 15-20, 2020 - Philadelphia, PA - ()] D31. ASTHMA EPIDEMIOLOGY - Variations in Serum Immunoglobulin E and Vitamin D Levels in Asthma Patients Attending a Tertiary Hospital in Southeast Nigeria

Eze, J.N., Ibegbu, M.D., Ebulue, C.E., Ikekpeazu, J.E., Ndubuisi, C.A., Orji, O.C., Onyedum, C.C.

File:

PDF, 228 KB

29

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Multiple-order imaging for optical critical dimension metrology using microscope characterization

Qin, Jing, Zhou, Hui, Barnes, Bryan M., Goasmat, Francois, Dixson, Ronald, Silver, Richard M., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 1.60 MB

english, 2012

30

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - New generation CMOS 2D imager evaluation and qualification for semiconductor inspection applications

Zhou, Wei, Hart, Darcy, Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 2.03 MB

english, 2013

31

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Reference metrology in a research fab: the NIST clean calibrations thrust

Dixson, Ronald, Allgair, John A., Raymond, Christopher J., Fu, Joe, Orji, Ndubuisi, Renegar, Thomas, Zheng, Alan, Vorburger, Theodore, Hilton, Al, Cangemi, Marc, Chen, Lei, Hernandez, Mike, Hajdaj, Ru

Year:

2009

Language:

english

File:

PDF, 603 KB

english, 2009

32

Interactions of higher order tip effects in critical dimension-AFM linewidth metrology

Dixson, Ronald, Ng, Boon Ping, Bonnaud, Xavier, Orji, Ndubuisi

Journal:

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Year:

2015

Language:

english

File:

PDF, 1.66 MB

english, 2015

33

SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Photomask applications of traceable atomic force microscope dimensional metrology at NIST

Dixson, Ronald, Naber, Robert J., Kawahira, Hiroichi, Orji, Ndubuisi G., Potzick, James, Fu, Joseph, Allen, Richard A., Cresswell, Michael, Smith, Stewart, Walton, Anthony J., Tsiamis, Andreas

Year:

2007

Language:

english

File:

PDF, 167 KB

english, 2007

34

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - A portable modular optical sensor capable of measuring complex multi-axis strain fields

Zhao, Weixin, Beck, B. Terry, Peterman, Robert J., Wu, Chih-Hang J., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 2.41 MB

english, 2012

35

SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Metrology, Inspection, and Process Control for Microlithography XXI - TEM calibration methods for critical dimension standards

Orji, Ndubuisi G., Dixson, Ronald G., Garcia-Gutierrez, Domingo I., Bunday, Benjamin D., Bishop, Michael, Cresswell, Michael W., Allen, Richard A., Allgair, John A., Archie, Chas N.

Year:

2007

Language:

english

File:

PDF, 677 KB

english, 2007

36

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Metrology and instrumentation challenges with high-rate, roll-to-roll manufacturing of flexible electronic systems

Subbaraman, Harish, Lin, Xiaohui, Xu, Xiaochuan, Dodabalapur, Ananth, Guo, L. Jay, Chen, Ray T., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 858 KB

english, 2012

37

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Re-calibration of the NIST SRM 2059 master standard using traceable atomic force microscope metrology

Dixson, Ronald, Kawahira, Hiroichi, Zurbrick, Larry S., Potzick, James, Orji, Ndubuisi G.

Year:

2008

Language:

english

File:

PDF, 313 KB

english, 2008

38

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Performances and limitations of Lab-to-Fab strategies for inline optical metrology

Nolot, E., André, A., Michallet, A., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 1.43 MB

english, 2012

39

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - NSF nanomanufacturing program and its implications for measurement and control

Cooper, Khershed P., Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 180 KB

english, 2013

40

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - Development of the size calibration SOP for SEM measurement

Kwon, Hyuksang, Noh, Si Yeon, Song, Nam Woong, Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 639 KB

english, 2013

41

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Optical testing for meter size aspheric optics

Su, Peng, Oh, Chang Jin, Zhao, Chunyu, Burge, James H., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 943 KB

english, 2012

42

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - Quantitative microscope characterization for optical measurements with sub-nm parametric uncertainties

Barnes, Bryan M., Qin, Jing, Zhou, Hui, Silver, Richard M., Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 704 KB

english, 2013

43

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - High-rate, roll-to-roll nanomanufacturing of flexible systems

Cooper, Khershed P., Wachter, Ralph F., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 283 KB

english, 2012

44

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Graphene Raman imaging and spectroscopy processing: characterization of graphene growth

Babenco, Matias G., Tao, Li, Akinwande, Deji, Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 2.27 MB

english, 2012

45

SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - Progress on implementation of a CD-AFM-based reference measurement system

Orji, Ndubuisi G., Archie, Chas N., Martinez, Angela, Dixson, Ronald G., Allgair, John

Year:

2006

Language:

english

File:

PDF, 441 KB

english, 2006

46

Advanced metrology needs for nanoelectronics lithography

Stephen Knight, Ronald Dixson, Ronald L. Jones, Eric K. Lin, Ndubuisi G. Orji, R. Silver, John S. Villarrubia, András E. Vladár, Wen-li Wu

Journal:

Comptes Rendus Physique

Year:

2006

File:

PDF, 987 KB

2006

47

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Active retroreflector to measure the rotational orientation in conjunction with a laser tracker

Hofherr, O., Wachten, C., Müller, C., Reinecke, H., Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 1.21 MB

english, 2012

48

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 12 August 2012)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VI - Imaging of short time microscopic scenes with strong light emission: revisited

Hahlweg, Cornelius, Zhao, Wenjing, Vogeler, Hendrik, Rothe, Hendrik, Postek, Michael T., Coleman, Victoria A., Orji, Ndubuisi G.

Year:

2012

Language:

english

File:

PDF, 1.95 MB

english, 2012

49

SPIE Proceedings [SPIE 26th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 25 February 2001)] Metrology, Inspection, and Process Control for Microlithography XV - Silicon single atom steps as AFM height standards

Dixson, Ronald G., Orji, Ndubuisi G., Fu, Joseph, Tsai, Vincent, Williams, Ellen D., Kacker, Raghu, Vorburger, Theodore V., Edwards, Hal L., Cook, Debra, West, Paul E., Nyffenegger, Ralph, Sullivan, N

Year:

2001

Language:

english

File:

PDF, 192 KB

english, 2001

50

SPIE Proceedings [SPIE SPIE NanoScience + Engineering - San Diego, California, United States (Sunday 25 August 2013)] Instrumentation, Metrology, and Standards for Nanomanufacturing, Optics, and Semiconductors VII - Advance in dimensional measurements of nano-objects based on defocusing of the electron probe of a scanning electron microscope

Filippov, M. N., Gavrilenko, V. P., Mityukhlyaev, V. B., Rakov, A. V., Todua, P. A., Postek, Michael T., Orji, Ndubuisi George

Year:

2013

Language:

english

File:

PDF, 784 KB

english, 2013

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